By John Wolstenholme
This e-book discusses using Auger electron spectroscopy (AES) and scanning Auger microscopy for the characterization of a variety of technological fabrics, together with, metals and alloys, semiconductors, nanostructures, and insulators. Its price as a device for high-resolution elemental imaging and compositional intensity profiling is illustrated and the application of the process for acquiring compositional details from the surfaces, interfaces, and skinny movie constructions of technological and engineering fabrics is verified. This quantity additionally describes the fundamental actual ideas of AES in easy, mostly qualitative phrases. significant elements of common Auger spectrometers also are defined. The e-book discusses different forms of research for which an Auger electron spectrometer can be used, for instance, secondary electron microscopy, backscattered electron imaging, X-ray spectroscopy, in addition to the connection among AES and different research concepts
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Additional info for Auger electron spectroscopy : practical application to materials analysis and characterization of surfaces, interfaces, and thin films
2 WHAT IS MEANT BY SURFACE ANALYSIS? AES is used for surface analysis but it is necessary to understand what that term means because the definition of the word surface can depend on the context in which it is used. In the context of AES the term surface refers to the top few atomic layers of a solid, up to about 10 nm. Consider a silicon sphere having a radius of 1 cm. 3 ppb (parts per billion) of the sphere as a whole. It is therefore essential that there is some form of filter that efficiently removes signal from the bulk material so that it does not swamp the signal coming from the near-surface region.
1652989 Persson, L. 1996. ” Acta Oncologica 35, p. 785. L. 1996. Lise Meitner: A Life in Physics. Berkeley, CA: University of California Press. 1 INTRODUCTION In an Auger electron spectrometer, the Auger electrons are emitted from the solid sample surface as a result of the interaction of a beam of highenergy, primary electrons with that surface. Typically, the energy of the beam is in the range 3 to 30 keV. Such an interaction also results in the emission of photons and electrons not originating from the Auger process.
7 QUANTIFICATION The first step for all methods for quantification is to measure a parameter that is proportional to the emitted Auger signal for each of the elements in the sample. 16. The Cu LMM Auger signal following subtraction of a background. under each peak or group of peaks can be measured following the subtraction of a suitable background. 16 in which the shaded area is the Auger signal used for the quantification. If the differentiated spectrum is used for quantification, then the peak-to-peak amplitude is used instead of the peak area.
Auger electron spectroscopy : practical application to materials analysis and characterization of surfaces, interfaces, and thin films by John Wolstenholme